Magnetron sputtering deposition Ti-B-C-N films by Ti/B4C compound target

作者：Tang Guangze; Ma Xinxin^*; Sun Mingren; Xu Shuyan

来源：Surface and Coatings Technology, 2009, 203(9): 1288-1291.

DOI：10.1016/j.surfcoat.2008.10.038

• Ti-B-C-N films
• X-ray
• Hardness
• Scratch test
• Magnetron sputtering deposition

Ti-B-C-N films were deposited by unbalanced DC magnetron sputtering with Ti/B4C compound target. The sputtering zone in the surface of the target was adjusted by a magnetic coil. X-ray photoelectron spectrum, X-ray diffraction, nano-indentation and scratch tests were used to analyze the film composition, phase structure, hardness, modulus and scratch resistance. The results showed that the composition of the Ti-B-C-N films can be adjusted by changing deposition parameters, such as gas ratio of N-2 to Ar and the magnetron coil current. The main crystal phase in the films was TiB2. The proportion of crystalline TiB2 decreased with the increasing of N-2 partial pressure and reached a maximum value at 300 mA magnetic coil current, when the coil current changed from 200 mA to 500 mA. The films containing more Ti(B)2 proportion showed higher hardness and modulus. The scratch resistance of the films increased with the films hardness.

• 出版日期2009-1-25
• 单位哈尔滨工业大学; 东北林业大学