Nanopatterning using a simple bi-layer lift-off process for the fabrication of a photonic crystal nanostructure

作者：Mao A^*; Schaper C D; Karlicek R F Jr

来源：Nanotechnology, 2013, 24(8): 085302.

DOI：10.1088/0957-4484/24/8/085302

A simple and versatile method for fabricating nanopatterns by a lift-off procedure is demonstrated. The technique involves the use of molecular transfer lithography based on water-soluble templates to form a nanopatterned UV-curable material on a PMGI layer, which serves as an underlying resin suitable for lift-off processes. This bi-layer procedure is used for the fabrication of nickel patterns, which are subsequently used as a hard mask for plasma etch processing. Using this procedure, a two-dimensional TiO2 photonic crystal layer with a 450 nm lattice constant is fabricated on Y3Al5O12:Ce3+ (YAG:Ce) yellow ceramic plate phosphor to enhance its forward emission. The yellow emission in the forward direction is improved by a factor of 3.5 compared to that of a conventional non-scattering YAG:Ce phosphor plate excited by a blue LED.

• 出版日期2013-3-1