Extended Point Defects in Crystalline Materials: Ge and Si

作者:Cowern N E B*; Simdyankin S; Ahn C; Bennett N S; Goss J P; Hartmann J M; Pakfar A; Hamm S; Valentin J; Napolitani E; De Salvador D; Bruno E; Mirabella S
来源:Physical Review Letters, 2013, 110(15): 155501.
DOI:10.1103/PhysRevLett.110.155501

摘要

B diffusion measurements are used to probe the basic nature of self-interstitial point defects in Ge. We find two distinct self-interstitial forms-a simple one with low entropy and a complex one with entropy similar to 30 k at the migration saddle point. The latter dominates diffusion at high temperature. We propose that its structure is similar to that of an amorphous pocket-we name it a morph. Computational modeling suggests that morphs exist in both self-interstitial and vacancylike forms, and are crucial for diffusion and defect dynamics in Ge, Si, and probably many other crystalline solids. DOI:10.1103/PhysRevLett.110.155501

  • 出版日期2013-4-8
  • 单位中国地震局