Adsorption and thermal dissociation of pyrrole on Si(100)-2 x 1

作者：Qiao MH; Tao F; Cao Y; Xu GQ^*

来源：Surface Science, 2003, 544(2-3): 285-294.

DOI：10.1016/j.susc.2003.08.039

• electron energy loss spectroscopy (EELS)
• visible and ultraviolet photoelectron spectroscopy
• X-ray photoelectron spectroscopy
• chemisorption
• surface chemical reaction
• silicon
• aromatics

The adsorption and thermal reaction of pyrrole on Si(1 0 0)-2 x 1 have been studied using X-ray and ultra-violet photoelectron spectroscopies (XPS and UPS) and high resolution electron energy loss spectroscopy (HREELS). At low exposures, Pyrrole chemisorbs molecularly at 120 K with its ring parallel to the surface via the pi-interaction. The increase in coverage causes tilting of chemisorbed molecules towards the surface normal, attributable to the adsorbate-adsorbate interactions. At similar to350 K, the N-H bond scission of the pi-bonded species occurs, resulting in Si-H and vertically N-bonded pyrrolyl on the surface. The pyrrolyl species is thermally stable to 700 K. Compared to furan or thiophene on Si(l 0 0), this higher thermal stability is ascribed to the passivation effect of the H-atoms from N-H bond dissociation and the less strain within the pyrrolyl-substrate complex. Further annealing to 900 K results in the formation of silicon carbide and silicon nitride on the substrate.

• 出版日期2003-10-20
• 单位复旦大学