Molecular Lithography through DNA-Mediated Etching and Masking of SiO2

作者：Surwade, Sumedh P.; Zhao, Shichao; Liu, Haitao^*

来源：Journal of the American Chemical Society, 2011, 133(31): 11868-11871.

DOI：10.1021/ja2038886

• GOLD NANOPARTICLES
• PATTERNED SURFACES
• ORIGAMI
• ARRAYS
• ADSORPTION

We demonstrate a new approach to pattern transfer for bottom-up nanofabrication. We show that DNA promotes/inhibits the etching of SiO2 at the single-molecule level, resulting in negative/positive tone pattern transfers from DNA to the SiO2 substrate.

• 出版日期2011-8-10
• 单位杭州电子科技大学