Damage behavior and atomic migration in MgAl2O4 under an 80 keV scanning focused probe in a STEM

作者：Zhu, Guo zhen; Botton, Gianluigi A^*

来源：Micron, 2015, 68: 141-145.

DOI：10.1016/j.micron.2014.05.010

• Beam damage behavior
• MgAl2O4
• STEM
• EELS

With the dramatic improvement in the spatial resolution of scanning transmission electron microscopes over the past few decades, the tolerance of a specimen to the high-energy electron beam becomes the limiting factor for the quality of images and spectra obtained. Therefore, a deep understanding of the beam irradiation processes is crucial to extend the applications of electron microscopy. In this paper, we report the structural evolution of a selected oxide, MgAl2O4, under an 80 keV focused electron probe so that the beam irradiation process is not dominated by the knock-on mechanism. The formation of peroxyl bonds and the assisted atomic migration were studied using imaging and electron energy-loss spectroscopic techniques.

• 出版日期2015-1
• 单位上海交通大学