Deposition of aluminum oxide-doped zinc oxide transparent nano-films on glass substrates for electrostatic discharge applications

作者：Aussawasathien Darunee^*; Teerawattananon Chanpen

来源：Materials Science in Semiconductor Processing, 2012, 15(3): 293-300.

DOI：10.1016/j.mssp.2012.03.008

• Aluminum oxide-doped zinc oxide
• Transparent nano-film
• Glass substrate
• Magnetron sputtering
• Electrostatic discharge

Aluminum oxide-doped zinc oxide (ZnO:Al2O3) transparent thin films were deposited by DC magnetron sputtering on glass substrates; film thickness can be correlated with deposition time. The effect of ZnO:Al2O3 film thickness on electrical properties, ultraviolet (UV) transmission, surface morphology and structure, solvent resistance, and scratch hardness was investigated. The surface roughness and crystallite size of deposited films increased from 0.75 to 2.22 nm and from 14 to 57 nm, respectively, as the film thickness was increased from 18 to 112 nm. In contrast, the percent UV transmission (% T) of ZnO:Al2O3 deposited glass plates at a wavelength of 365 nm increased when the film thickness was decreased. The electrical properties of nano-film deposited glass plates such as electrical resistance, tribo-charge voltage, and decay time were in the range of electrostatic discharge (ESD) specifications. The ZnO:Al2O3 nano-film deposited glass substrate possessed good acetone and iso-propanol resistance as well as high scratch hardness. This work opens up the possibility of using the ZnO:Al2O3 transparent ultra-thin film on glass substrate in ESD applications based on their excellent properties in terms of the relatively thin and adjustable ZnO:Al2O3 film thickness needed.

• 出版日期2012-6