摘要
A control strategy for tuning the film morphology of asymmetric polystyrene-b-poly(4-vinylpyridine) (PS-b-P4VP) block copolymers (BCPs) is reported. After preparation of the film by spin-coating method, the as-cast films were annealed in different solvent vapor. It is found that chloroform is a wonderful solvent for forming PS-b-P4VP regular pattern. Otherwise, with changing the concentration of PS-b-P4VP, cylindrical or parallel nanostructures could be attained. The PS-b-P4VP films with cylindrical structure are used as template to deposit FePt nanoparticles into the pores. Nanoparticles reaching the bottom of the holes form a disordered magnetic array.