Atmospheric Pressure Process for Coating Particles Using Atomic Layer Deposition

作者：Beetstra Renske^*; Lafont Ugo; Nijenhuis John; Kelder Erik M; van Ommen J Ruud

来源：Chemical Vapor Deposition, 2009, 15(7-9): 227-233.

DOI：10.1002/cvde.200906775

• Atmospheric pressure
• ALD
• Electrode
• Fluidized bed reactor
• Nanostructured particles

Atomic layer deposition (ALD) is a promising technique for coating micrometer- and nanometer-sized particles. Due to the self-terminating nature of the ALD half-reactions, the coating thickness can be controlled to the atomic level by choosing the number of cycles in which the half-reactions are repeated. This technique is performed in a fluidized bed reactor, under atmospheric pressure. LiMn(2)O(4) particles (primary particles 200 - 500 nm in diameter) are coated with Al(2)O(3) to various thicknesses, ranging from 5 ALD cycles to 28 ALD cycles. The resulting coatings are homogeneous, and the individual particles are coated, rather than the agglomerates as a whole; however there are indications of some build-up of water-mainly in pores-that may be related to the use of atmospheric pressure. Quantitative characterization of the coating is difficult due to the powdered substrate.

• 出版日期2009-9