Analysis of a scheme for de-magnified Talbot lithography

作者：Urbanski L^*; Marconi M C; Isoyan A; Stein A; Menoni C S; Rocca J J

来源：Journal of Vacuum Science and Technology B, 2011, 29(6): 06F504.

DOI：10.1116/1.3653507

• masks
• nanofabrication
• nanolithography
• nanopatterning
• nanostructured materials
• periodic structures
• photoresists
• replica techniques
• soft lithography
• Talbot effect
• ultraviolet lithography

The authors describe a photolithographic scheme based on the replication of a periodic transparent mask in a photoresist utilizing the coherent self-imaging Talbot effect. A periodic two-dimensional diffractive structure (or Talbot mask) composed of unit tiles distributed in a square matrix was illuminated by a coherent extreme ultraviolet (EUV) beam from a table top EUV laser. The illumination beam was reflected in a spherical mirror and the Talbot mask was placed in the path of the convergent beam. At designed locations determined by the Talbot distance, reduced replicas of the mask were obtained and used to print the slightly de-magnified copies of the mask on the surface of a photoresist. Experimental results showing the de-magnification effect are in good agreement with the diffraction theory. The limits of the technique are discussed.

• 出版日期2011-11