Microstructure evolution of polycrystalline Ti2AlN MAX phase film during post-deposition annealing

作者：Wang, Tao^*; Chen, Zhe; Wang, Guoqing; Wang, Lei; Zhang, Guojun^*

来源：Journal of the European Ceramic Society, 2018, 38(15): 4892-4898.

DOI：10.1016/j.jeurceramsoc.2018.07.028

• Ti2AlN
• MAX phase
• Thin films
• Thermal stability

Polycrystalline Ti2AlN MAX phase films were fabricated by post-deposition annealing of Ti-Al-N film at annealing temperature in the range of 600 degrees C-800 degrees C in high vacuum. The temperature-dependent microstructure evolution from Ti-Al-N film to polycrystalline Ti2AlN film has been investigated. It was found that after post deposition annealing above 600 degrees C, the as-deposited amorphous Ti-Al-N film transformed to polycrystalline Ti2AlN film. With the increase of annealing temperature from 600 degrees C to 700 degrees C, the crystallinity of polycrystalline Ti2AlN film was improved. At 800 degrees C, the surface Ti2AlN grains completely decomposed and transformed to TiN phase while inner grains was partial decomposed and surrounded by amorphous Al-rich phase. The polycrystalline Ti2AlN film exhibited a highest hardness of 34.1 GPa while the hardness of amorphous Ti-Al-N film was only 24.2 GPa. The mechanism of texture changes and phase transformation as well as its effect on thermal stability was also discussed.

• 出版日期2018-12
• 单位西安理工大学