Adsorption of toluene on Si(100)/SiO2 substrate and mesoporous SBA-15

作者：Mirji SA^*; Halligudi SB; Sawant DP; Patil KR; Gaikwad AB; Pradhan SD

来源：Colloids and Surfaces A: Physicochemical and Engineering Aspects , 2006, 272(3): 220-226.

DOI：10.1016/j.colsurfa.2005.07.019

• Si(100)
• SBA-15
• toluene
• adsorption
• thermal stability

Adsorption of toluene on Si(100)/SiO2 substrate and mesoporous SBA-15 has been studied by using energy dispersive X-ray analysis (EDAX), Fourier transform infrared (FTIR) spectroscopy and X-ray photoelectron spectroscopy (XPS) techniques. Contact angle technique is used to study the adsorption kinetics of toluene on Si(100)/SiO2 and thermal stability of adsorbed toluene layer. Scanning electron microscopy (SEM) technique is used to observe SBA-15 particles before and after toluene adsorption. Thermogravimetric (TGA) technique is employed to understand the thermal behavior of toluene layer on SBA-15. Adsorption kinetics fit fairly well with Langmuir isotherms giving adsorption rate constant, k(a) = 0.000054 M-1 S-1. SEM pictures clearly reveal assembly of SBA-15 particles mediated by toluene adsorption. EDAX and XPS results confirm toluene adsorption. FTIR results show presence of aromatic bends, ring stretch, combination bands, C-H stretch, methyl C-H symmetric and asymmetric stretches indicating toluene adsorption. Thermal stability study also indicates toluene adsorption.

• 出版日期2006-1-16