Ultra-high mobility two-dimensional electron gas in a SiGe/Si/SiGe quantum well

作者:Melnikov M Yu*; Shashkin A A; Dolgopolov V T; Huang S H; Liu C W; Kravchenko S V
来源:Applied Physics Letters, 2015, 106(9): 092102.
DOI:10.1063/1.4914007

摘要

We report the observation of an electron gas in a SiGe/Si/SiGe quantum well with maximum mobility up to 240 m(2)/Vs, which is noticeably higher than previously reported results in silicon-based structures. Using SiO, rather than Al2O3, as an insulator, we obtain strongly reduced threshold voltages close to zero. In addition to the predominantly small-angle scattering well known in the high-mobility heterostructures, the observed linear temperature dependence of the conductivity reveals the presence of a short-range random potential.