Dependence of film surface roughness and slope on surface migration and lattice size in thin film deposition processes

作者：Huang Jianqiao; Hu Gangshi; Orkoulas Gerassimos; Christofides Panagiotis D^*

来源：Chemical Engineering Science, 2010, 65(23): 6101-6111.

DOI：10.1016/j.ces.2010.08.035

• Thin film growth
• Microscopic modeling
• Surface migration
• Surface roughness
• Surface slope
• Lattice size

This work focuses on the study of the dependence of film surface roughness and slope on lattice size in thin film deposition processes. Two different models of thin film deposition processes, in both 1D and 2D, are considered: random deposition with surface relaxation model and deposition/migration model. Surface roughness and surface slope are defined as the root-mean-squares of the surface height profile and of the surface slope profile, respectively. Both surface roughness and slope evolve to steady-state values at large times but are subject to different dynamics and scaling properties. A linear and a logarithmic dependence of surface roughness square on lattice size are observed in the 1D and 2D lattice models, respectively, in both the random deposition with surface relaxation model and the deposition/migration model with zero activation energy contribution from each neighboring particle. Furthermore, a stronger lattice-size dependence is found in the deposition/migration model when the migration activation energy contribution from each neighboring particle becomes significant. On the other hand, a weak lattice-size dependence is found for the surface mean slope in all growth models considered, especially at large lattice sizes. Finally, the dynamics of surface roughness and surface slope is studied with respect to different characteristic length scales.

• 出版日期2010-12-1