High-temperature ferromagnetism of Si1-xMnx (x approximate to 0.52-0.55) alloys

作者:Rylkov V V*; Bugaev A S; Novodvorskii O A; Tugushev V V; Kulatov E T; Zenkevich A V; Semisalova A S; Nikolaev S N; Vedeneev A S; Shorokhova A V; Aver'yanov D V; Chernoglazov K Yu; Gan'shina E A; Granovsky A B; Wang Y; Panchenko V Ya; Zhou S
来源:Journal of Magnetism and Magnetic Materials, 2015, 383: 39-43.
DOI:10.1016/j.jmmm.2014.09.028

摘要

The paper reports on the comprehensive study of properties of nonstoichiometric Si1-xMnx, alloys slightly enriched in Mn (x approximate to 0.51-0.55) as compared to the stoichiometric monosilicide MnSi. Mosaic type Si1-xMnx films 55-70 nm in thickness were produced by the pulsed laser deposition (PLD) method onto the single crystalline Al2O3 substrates at 340 The Curie temperature T-C in nonstoichiometric Si1-xMnx (x approximate to 0.52-0.55) films exceeds room temperature, while in their stoichiometric counterpart, MnSi, the T-C value does not exceed approximate to 30 K. The consistent data on anomalous Hall effect and transverse Kerr effect prove the global character of ferromagnetic (FM) order caused by magnetic defect formation rather than the presence of FM clusters. At Mn content x <= 0.55, the magnetization data testify to a good homogeneity in the distribution of magnetic defects without their segregation: variations of the saturation magnetization M-s do not exceed 6% in the temperature range T=10-100 K and are well described by the Bloch law It is also revealed that textured high-quality Si1-xMnx films with x approximate to 0.52 and T-C similar to 300 K could be formed by PLD method in the "shadow" geometry (at lower energy of deposited atoms).

  • 出版日期2015-6-1