Study on the effect of heat treatment conditions on metalorganic-chemical-vapor-deposited ferroelectric Hf0.5Zr0.5O2 thin film on Ir electrode

作者：Shimizu Takao^*; Yokouchi Tatsuhiko; Shiraishi Takahisa; Oikawa Takahiro; Krishnan P S Sankara Rama; Funakubo Hioshi

来源：Japanese Journal of Applied Physics, 2014, 53(9): 09PA04.

DOI：10.7567/JJAP.53.09PA04

The effect of the heat treatment conditions on the constituent phases and electrical properties of (Hf(0.5)Z(0.5))O-2 films deposited by the metalorganic chemical vapor deposition was investigated. By using a low temperature or short duration for post-heat treatment after the deposition, the volume fraction of the tetragonal phase increases, resulting in a high dielectric constant. On the other hand, the volume fraction of the monoclinic phase increased in the films that were heat-treated at higher temperatures and exposed to longer heat treatment duration. The ferroelectric with and dielectric properties of these films were greatly inferior. Superior ferroelectric properties a significant volume fraction of orthorhombic phase were achieved for intermediate heat treatment conditions. These results give useful information to understand the origin of the ferroelectricity and to control the phases and electrical properties in HfO2-based films.

• 出版日期2014-9