Application of new photolabile protecting groups as photocleavable joints of block copolymers

作者：Lu Wenya; Tian Chong; Thogaripally Punith; Hu Jun; Wang Pengfei^*

来源：Chemical communications, 2013, 49(83): 9636-9638.

DOI：10.1039/c3cc44799e

New photoresponsive block copolymers (BCPs) have been developed by incorporating photocleavable units. These photocleavable units are derived from robust photolabile protecting groups (PPGs); UV irradiation cleaves the BCPs and releases a well-defined chemically active functional group at the cleaved end of a PS polymer.

• 出版日期2013