摘要

A novel approach to the inspection of nanoparticle habit was proposed in our previous papers. This approach is based on a joint analysis of two scanning electron microscopy (SEM) images corresponding to different convergences of illuminating electron beams. However, increasing convergence worsens an image as the result of spherical aberration. Therefore, for the first time in this paper we describe in detail a new approach which is an alternative to the method of two convergences. It is based on the use of two defocusings which are identical in size, but opposite in signs, thereby. simplifying the demands of SEM.

  • 出版日期2013-6-11