摘要

To enhance the non-diffracting distance of propagation-invariant beams, fabrication of an axicon with large aperture diameter and height is essential. It is noted, however, that fabrication of continuous surface profile micro-optical elements with a large physical height (thick resist) is prone to various fabrication constraints and errors. We employ the kinoform technique to alleviate such problems in the fabrication of axicons. In this paper kinoform micro-axicons and kinoform micro-double-axicons are designed and fabricated employing electron beam lithography techniques to generate a Bessel beam and a self-imaged bottle beam with long non-diffracting distance. Furthermore, a detailed study of power conversion efficiency of kinoform structures is discussed.