科研之友
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摘要
In this work microstructures with high-aspect-ratio were produced by two-photon photopolymerization technique in SU-8 photoresist. When micrometer or submicrometer size features are realized, the standard protocol for processing the photoresist has to be adapted to the dimension of the desired structures. Using the suitable parameters of the protocol for exposure and development of the photopolymer, microstructures with aspect-ration more than 10:1 were obtained.
- 出版日期2010-1
