Al-Doped Zinc Oxide Film Deposition in Function of Power by AC Bipolar Pulse in Reactive Magnetron Sputtering

作者：Garcia Garcia J^*; Pacheco Sotelo J; Valdivia Barrientos R; Rivera Rodriguez C; Pacheco Pacheco M; Gonzalez Jean Jacques; Soria Arguello G; Nieto Perez M

来源：IEEE Transactions on Plasma Science, 2011, 39(11): 2484-2485.

DOI：10.1109/TPS.2011.2160368

• Plasma materials processing
• sputtering

A reactive magnetron sputtering reactor powered by an ac bipolar pulse power source was used to grow aluminum-doped zinc oxide (ZnO: Al or AZO) on polypropylene films. The ac bipolar pulses and the electrode configuration assure a stable and arc-free material deposition at room temperature. The films were obtained in a reactive atmosphere of argon and oxygen at 1-Pa pressure and power ranges from 20 to 36 W. The surface of the AZO film was characterized using scanning electron microscopy.

• 出版日期2011-11