Multibit MoS2 Photoelectronic Memory with Ultrahigh Sensitivity

作者:Lee Dain; Hwang Euyheon; Lee Youngbin; Choi Yongsuk; Kim Jong Su; Lee Seungwoo; Cho Jeong Ho*
来源:Advanced Materials, 2016, 28(41): 9196-+.
DOI:10.1002/adma.201603571

摘要

A novel multibit MoS2 photoelectronic nonvolatile memory device is developed by synergistically combining rational device designs and the efficient transfer of large-area MoS2 flakes. The MoS2 photo electronic memory exhibits excellent memory characteristics, including a large programming/erasing current ratio that exceeds 10(7), multilevel data storage of 3 bits (corresponding to eight levels), performance stability over 200 cycles, and stable data retention over 10(4) s.

  • 出版日期2016-11-2