Nanophotonic devices on thin buried oxide Silicon-On-Insulator substrates

作者:Sridaran Suresh*; Bhave Sunil A
来源:Optics Express, 2010, 18(4): 3850-3857.
DOI:10.1364/OE.18.003850

摘要

We demonstrate a silicon photonic platform using thin buried oxide silicon-on-insulator (SOI) substrates using localized substrate removal. We show high confinement silicon strip waveguides, micro-ring resonators and nanotapers using this technology. Propagation losses for the waveguides using the cutback method are 3.88 dB/cm for the quasi-TE mode and 5.06 dB/cm for the quasi-TM mode. Ring resonators with a loaded quality factor (Q) of 46,500 for the quasi-TM mode and intrinsic Q of 148,000 for the quasi-TE mode have been obtained. This process will enable the integration of photonic structures with thin buried oxide SOI based electronics.

  • 出版日期2010-2-15