A general model for chemical erosion of carbon materials due to low-energy H+ impact

作者：Liu, Shengguang^*; Sun, Jizhong; Dai, Shuyu; Stirner, Thomas; Wang, Dezhen

来源：Journal of Applied Physics, 2010, 108(7): 073302.

DOI：10.1063/1.3485821

• 0001 GRAPHITE SURFACE
• ION FLUX DENSITIES
• HYDROCARBON FORMATION
• PYROLYTIC-GRAPHITE
• SPUTTERING YIELDS
• PUMP LIMITER
• ATOM IMPACT
• TORE-SUPRA
• HYDROGEN
• BOMBARDMENT

Modeling the chemical erosion of carbon materials due to low-energy H+ impact is of paramount importance for the prediction of the behavior of carbon-based plasma-facing components in nuclear fusion devices. In this paper a simple general model describing both energy and temperature dependence of carbon-based chemical erosion is presented. Enlightened by Hopf's model {Hopf et al., [J. Appl. Phys. 94, 2373 (2003)}, the chemical erosion is separated into the contributions from three mechanisms: thermal chemical erosion, energetic chemical sputtering, and ion-enhanced chemical erosion. Using input from the Monte Carlo code TRIDYN, this model is able to reproduce experimental data well.

• 出版日期2010-10-1
• 单位大连理工大学