Arrays of Nanoscale Lenses for Subwavelength Optical Lithography

作者：Jang Jae Won; Zheng Zijian; Lee One Sun; Shim Wooyoung; Zheng Gengfeng; Schatz George C^*; Mirkin Chad A

来源：Nano Letters, 2010, 10(11): 4399-4404.

DOI：10.1021/nl101942s

• Dip-pen
• lithography
• poly(ethylene glycol)
• photomask
• photoresist
• phase-shift
• nano
• lens
• finite element method
• simulation

Poly(ethylene glycol) (PEG) polymer lens arrays are made by using dip-pen nanolithography to deposit nanoscale PEG features on hydrophobically modified quartz glass. The dimensions of the PEG lenses are controlled by tuning dwell time and polymer molecular weight. The PEG polymer lenses on the quartz substrate act as a phase-shift photomask for fabricating subwavelength scale features, similar to 100 nm in width. Depending upon UV irradiation time during the photolithography, the photoresist nanostructures can be transitioned from well-shaped (short time) to ring-shaped (long time) features. The technique can be used to pattern large areas through the use of cantilever arrays.

• 出版日期2010-11
• 单位西北大学