A Critical Appraisal of the Nanoindentation Creep 'Nose' Effect in Ni Thin Films

作者:Ma, Zengsheng; Zhou, Yichun*; Long, Shiguo; Pan, Yong
来源:Journal of Nanoscience and Nanotechnology, 2012, 12(2): 955-958.
DOI:10.1166/jnn.2012.5795

摘要

The creep behaviour of polycrystal Ni thin films under the same maximum load (P-max = 8000 mu N) and different unloading periods (ranging from 1 to 250 s) has been investigated at room temperature using nanoindentation tests. A 'nose' has been observed in the unloading segment of the load-penetration depth curve when the holding time at peak load is short and/or the unloading rate is small, and when the peak load is sufficient high. When a 'nose' presents, the apparent unloading stiffness S-u, defined as dP/dh, is negative, and the reduced modulus can no longer be calculated from the Oliver-Pharr method. Taking such uncertainties into account, a critical appraisal is proposed for ranking creep propensities exhibited during nanoindentation under specified conditions.