Morphology dependent electrochemical performance of sputter deposited Sn thin films

作者：Nimisha C S; Venkatesh G; Rao K Yellareswara; Rao G Mohan^*; Munichandraiah N

来源：Materials Research Bulletin, 2012, 47(8): 1950-1953.

DOI：10.1016/j.materresbull.2012.04.035

• Thin films
• Sputtering
• Electrochemical measurements
• Electron microscopy
• Atomic force microscopy

This study deals with tailoring of the surface morphology, microstructure, and electrochemical properties of Sn thin films deposited by magnetron sputtering with different deposition rates. Scanning electron microscopy and atomic force microscopy are used to characterize the film surface morphology. Electrochemical properties of Sn thin film are measured and compared by cyclic voltammetry and charge-discharge cycle data at a constant current density. Sn thin film fabricated with a higher deposition rate exhibited an initial discharge capacity of 798 mAh g(-1) but reduced to 94 mAh g(-1) at 30th cycle. Film deposited with lower deposition rate delivered 770 mAh g(-1) during 1st cycle with improved capacity retention of 521 mAh g(-1) on 30th cycle. Comparison of electrochemical performances of these films has revealed important distinctions, which are associated with the surface morphology and hence on rate of deposition.

• 出版日期2012-8