Asymmetric resistive switching processes in W:AlOx/WOy bilayer devices

作者:Wu Hua-Qiang*; Wu Ming-Hao; Li Xin-Yi; Bai Yue; Deng Ning; Yu Zhi-Ping; Qian He
来源:Chinese Physics B, 2015, 24(5): 058501.
DOI:10.1088/1674-1056/24/5/058501

摘要

Asymmetric resistive switching processes were observed in W:AlOx/WOy bilayer RRAM devices. During pulse programming measurements, the RESET speed is in the range of hundreds of microseconds under -1.1 V bias, while the SET speed is in the range of tens of nanoseconds under 1.2 V bias. Electrical measurements with different pulse conditions and different temperatures were carried out to understand these significant differences in switching time. A redox reaction model in the W:AlOx/WOy device structure is proposed to explain this switching time difference.