Direct patterning, Conformal coating, and erbium doping of luminescent nc-Si/SiO2 thin films from solution processable hydrogen silsesquioxane

作者：Hessel Colin M; Summers Mark A; Meldrum Al; Malac Marek; Veinot Jonathan G C^*

来源：Advanced Materials, 2007, 19(21): 3513-+.

DOI：10.1002/adma.200700731

Hydrogen silsesquioxane is used as a solution-borne molecular precursor in the fabrication of highly luminescent thin films of SiO2 containing silicon nanocrystals. Films are readily formed on non-flat substrates (e.g., optical fibers) and patterned using e-beam lithography (see figure).

• 出版日期2007-11-5