Use of a nanostructured surface coating to achieve higher sputter rates

作者：Flege S^*; Hatada R; Kaiser T; Muench E; Cherkashinin G; Schwoebel A; Ensinger W; Baba K

来源：Materials Letters, 2016, 164: 532-534.

DOI：10.1016/j.matlet.2015.11.059

• Sputtering
• Nanostructures
• Thin films

A method is presented which leads to a higher sputter rate as compared to the sputtering of the surface of a bulk sample under the same sputtering conditions: the target is coated beforehand by a separate process to produce a nanostructured film on its surface. In the case of silver, the sputter yield under ion bombardment is 1.7 times higher. If the ions for the bombardment are generated by a voltage applied to the sample, then improvements up to a factor of five can be realized.

• 出版日期2016-2-1