摘要
Here we report a new sample preparation method for three-dimensional electron tomography. The method uses the standard film deposition and focused ion beam (FIB) methods to significantly reduce the problems arising from the projected sample thickness at high tilt angles. The method can be used to prepare tomography samples that can be imaged up to a +/- 75 degrees tilt range which is sufficient for many practical applications. The method can minimize the problem of Ga+ contamination, as compared to the case of FIB preparation of rod-shaped samples, and provides extended thin regions for standard 2D projection analyses. Microsc. Res. Tech. 75:11651169, 2012.
- 出版日期2012-9