(Ti,W,Cr)B-2 coatings produced by dc magnetron sputtering

作者：Newirkowez A; Cappi B; Telle R; Schmidt H^*

来源：Thin Solid Films, 2012, 520(6): 1775-1778.

DOI：10.1016/j.tsf.2011.08.071

• Transion metal diborides
• Coatings
• Sputtering
• Nanostructures
• X-ray diffraction
• Scanning electron microscopy

Transition metal diboride coatings of composition (Ti0.44W0.29Cr0.27)B-1.90 were deposited on silicon sub-strates by dc magnetron sputtering of compound targets. The chemical composition of the targets is transferred to the sputtered films. The as-deposited films are amorphous as indicated by grazing incidence X-ray diffraction. Investigations with electron microscopy revealed that the films show a columnar nanostructure. Annealing at temperatures between 1000 degrees C and 1300 degrees C leads to the formation of nano-crystalline precipitations, which can be attributed to (Ti,W,Cr)B-2, beta-(W, Ti, Cr)B and W2B4 phases. Annealing can be used to tailor the average grain size of the precipitates, making these films a good candidate for hard coatings re-enforced by nano-structuring.

• 出版日期2012-1-1