Autocatalytic growth of Co on pure Co surfaces using Co-2(CO)(8) precursor

作者：Cordoba R; Sese J; Ibarra M R; De Teresa J M^*

来源：Applied Surface Science, 2012, 263: 242-246.

DOI：10.1016/j.apsusc.2012.09.037

• Co-2(CO)(8)
• Autocatalytic growth
• Focused-electron-beam induced deposition

The autocatalytic growth of Co on different surfaces using the Co-2(CO)(8) precursor is investigated. It is observed that Co-2(CO)(8) molecules dissociate spontaneously on pure Co surfaces grown by sputtering, forming a pure Co film. The microstructure of this film consists of Co nanocrystals with size below 100 nm. However, when the same type of experiment is done on a Co surface grown by focused-electron-beam induced deposition there is no autocatalytic growth of Co. On other surfaces such as Si substrates and Al films grown by sputtering, the spontaneous dissociation of the Co-2(CO)(8) molecules does not occur. The origin and implications of these results are discussed.

• 出版日期2012-12-15