摘要

We here report the manifestation of weak localization effects in the electrical resistivity of TaN(001) films grown on MgO(001) substrates by a pulsed laser deposition technique. These films were characterized by X-ray diffraction and Rutherford backscattering. High precision electrical resistivity measurements were performed on these films in the temperature range 12-300 K. A careful analysis of data showed these films to lie in the weakly localized regime with negative temperature coefficient of resistivity throughout the whole temperature range of study. A crossover from 2D localization at lower temperatures to 3D localization at higher temperatures was observed.

  • 出版日期2002-12-20