Multiple Nanoscale Templates by Orthogonal Degradation of a Supramolecular Block Copolymer Lithographic System

作者：Tang Chuanbing; Sivanandan Kulandaivelu; Stahl Brian C; Fredrickson Glenn H^*; Kramer Edward J; Hawker Craig J

来源：ACS Nano, 2010, 4(1): 285-291.

DOI：10.1021/nn901330q

• block copolymer lithography
• templates
• supramolecular assembly
• thin films

An orthogonal approach to the creation of multiple nanoscale templates from a single supramolecular block copolymer system is presented. The enabling feature of this strategy is the design of block copolymers that incorporate independent degradation chemistries which permits each block copolymer to be addressed individually and sequentially. By blending a block copolymer containing H-bond donor groups and a UV-degradable domain with the complementary copolymer containing H-bond acceptor groups and an acid-cleavable segment, diverse and tunable nanoporous thin films with different pore sizes and array patterns can be obtained. This robust strategy demonstrates the potential of combining orthogonal chemistry with the inherent tunability of supramolecular systems,

• 出版日期2010-1