科研之友
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摘要
In this paper the influence of precursor ( titanium tetraisopropoxide (TTIP)) temperature, precursor and gas flow rates on the surface properties of TiO2 thin films deposited by atmospheric dielectric barrier discharge (ADBD) chemical vapour deposition (CVD) were investigated. Argon was used as working gas. Influence of O-2 used as oxidizer was evaluated for determination of hydrophilicity of the films. Surface morphology of the thin TiO2 films deposited on glass substrates was studied by the atomic force microscopy (AFM) and water contact angle ( CA) measurement. CA tests proved wettability improvement in experiments with oxygen addition.
- 出版日期2008
