Atomic layer deposition of tin dioxide sensing film in microhotplate gas sensors

作者:Niskanen Antti J*; Varpula Aapo; Utriainen Mikko; Natarajan Gomathi; Cameron David C; Novikov Sergey; Airaksinen Veli Matti; Sinkkonen Juha; Franssila Sami
来源:Sensors and Actuators B: Chemical , 2010, 148(1): 227-232.
DOI:10.1016/j.snb.2010.05.018

摘要

We report the use of atomic layer deposition (ALD) to produce the gas-sensitive tin dioxide film in a microhotplate gas sensor. The performance of the device was demonstrated using ethanol, acetone and acrylonitrile as model analytes. Fast response times and low drift rates of the output signal were measured, indicating a structurally stable tin dioxide film and reflecting the capabilities of ALD in gas sensor applications. Fabrication of the microhotplate using tungsten metallization and plasma deposited silicon dioxide dielectrics is also detailed.

  • 出版日期2010-6-30