Dynamical Model for the Formation of Patterned Deposits at Receding Contact Lines

作者:Frastia Lubor*; Archer Andrew J; Thiele Uwe
来源:Physical Review Letters, 2011, 106(7): 077801.
DOI:10.1103/PhysRevLett.106.077801

摘要

We describe the formation of deposition patterns that are observed in many different experiments where a three-phase contact line of a volatile nanoparticle suspension or polymer solution recedes. A dynamical model based on a long-wave approximation predicts the deposition of irregular and regular line patterns due to self-organized pinning-depinning cycles corresponding to a stick-slip motion of the contact line. We analyze how the line pattern properties depend on the evaporation rate and solute concentration.

  • 出版日期2011-2-16