Atomic Layer Deposition for Sensitized Solar Cells: Recent Progress and Prospects

作者：Kim Do Han; Losego Mark D; Peng Qing; Parsons Gregory N^*

来源：Advanced Materials Interfaces, 2016, 3(21): 1600354.

DOI：10.1002/admi.201600354

Atomic layer deposition (ALD) and molecular layer deposition (MLD) are vapor phase deposition techniques used to create conformal coatings with molecular-level control of thickness and composition. Recently, ALD and MLD have been extensively exploited to engineer the complex interfaces of dye-sensitized solar cells (DSSCs) and other molecularly functionalized photo-electrochemical devices to improve the performance and long-term stability. This progress report describes the recent advances in the applications of ALD and MLD for sensitized solar cells including DSSCs then discusses current challenges and future opportunities of ALD.

• 出版日期2016-11-7
• 单位MIT