摘要
We report on an integrated lambda/4-shifted Bragg grating array using a wafer-scale complementary metal-oxide semiconductor (CMOS) compatible process with silicon-nitride waveguides. A sidewall grating was used to simplify the fabrication process, and a sampled Bragg grating with equivalent phase-shift structure was employed to achieve an accurate lambda/4 phase shift. A four-channel lambda/4-shifted Bragg grating array with highly uniform channel spacing was demonstrated with a measured channel spacing variation below 10 pm (1.25 GHz). The high channel-spacing uniformity and the CMOS-compatibility of the demonstrated device hold promise for integrated distributed feedback laser arrays for various silicon photonic applications.
- 出版日期2013-10-15
- 单位MIT