科研之友
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摘要
A simple solution to lithographically write down to 20-30 nm features over micrometer-sized nanoparticle arrays with high fidelity of pattern transfer from the designed to fabricated architectures is shown. It is achieved via a two-step approach: (i) fabrication of basic shape nanoparticles by electron beam lithography, gold deposition via sputtering and lift-off, then (ii) nano-patterning by focused ion beam lithography. Application potential of 3D tailored nanoparticles for nanotweezers is discussed on the basis of numerical modeling and experimental measurements of extinction.
- 出版日期2013-6
