Atomic layer deposition of HfO2: Effect of structure development on growth rate, morphology and optical properties of thin films

作者：Rammula Raul^*; Aarik Jaan; Maendar Hugo; Ritslaid Peeter; Sammelselg Vaeino

来源：Applied Surface Science, 2010, 257(3): 1043-1052.

DOI：10.1016/j.apsusc.2010.07.105

• Hafnium dioxide
• Atomic layer deposition (ALD)
• Structure
• Crystallization
• Topography

HfO2 films were grown by atomic layer deposition from HfCl4 and H2O on Si(100), Si(111) and amorphous SiO2 substrates at 180-750 degrees C and the effect of deposition temperature and film thickness on the growth rate and optical properties of the film material was studied. Crystallization, texture development and surface roughening were demonstrated to result in a noticeable growth rate increase with increasing film thickness. Highest surface roughness values were determined for the films deposited at 350-450 degrees C on all substrates used. The density of the film material increased with the concentration of crystalline phase but, within experimental uncertainty, was independent of orientation and sizes of crystallites in polycrystalline films. Refractive index increased with the material density. In addition, the refractive index values that were calculated from the transmission spectra depended on the surface roughness and crystallite sizes because the light scattering, which directly influenced the extinction coefficient, caused also a decrease of the refractive index determined in this way.

• 出版日期2010-11-15