Application of Cryptand to Diazo/PVA Resists

作者：Okada Masaki^*; Harada Kieko; Takamura Naohide; Hiaki Toshihiko; Matsuda Kiyomi; Hamana Hiroshi; Takahara Shigeru; Sugita Kazuyuki

来源：Journal of Photopolymer Science and Technology, 2010, 23(3): 413-416.

DOI：10.2494/photopolymer.23.413

• photosensitive diazo compound
• diazo/PVA resist
• cryptand
• photodecomposition

Photo- and thermal reaction of p-substituted benzene diazo compounds (SBD) with [2.2.2]-cryptand (CRP) was studied by UV spectrum and degradation temperature (D.T.). Diazo cation of p-chloro benzene diazo compound (ClBD) was reacted with lone pair electrons of nitrogen atom of CRP by UV spectrum data. When CRP was added, photodecomposition rate of SBD with electron withdrawing-substituent (WSBD) and of SBD with electron donating-substituent (DSBD) were accelerated two and ten times larger than that without CRP, respectively. D.T. of WSBD with CRP in solid were lower than that without CRP, but D.T. of DSBD with CRP was similar to that without CRP. Photodecomposition rate of a diphenylamine-4-diazonium sulfate salt/formaldehyde condensate (DSR) / Polyvinyl alcohol (PVA) resist with CRP was 3 times higher than that without CRP. Diazo/PVA resist with CRP will be improved in sensitivity without decreasing thermal stability.

• 出版日期2010