Non-Close-Packed Crystals from Self-Assembled Polystyrene Spheres by Isotropic Plasma Etching: Adding Flexibility to Colloid Lithography

作者：Plettl Alfred^*; Enderle Fabian; Saitner Marc; Manzke Achim; Pfahler Christian; Wiedemann Stefan; Ziemann Paul

来源：Advanced Functional Materials, 2009, 19(20): 3279-3284.

DOI：10.1002/adfm.200900907

Hexagonally ordered arrays of non-close-packed nanoscaled spherical polystyrene (PS) particles are prepared exhibiting precisely controlled diameters and interparticle distances. For this purpose, a newly developed isotropic plasma etching process is applied to extended monolayers of PS colloids (starting diameters <300 nm) deposited onto hydrophilic silicon. Accurate size, shape, and smoothness control of such particles is accomplished by etching at low temperatures (-150 degrees C) with small rates not usually available in standard reactive ion etching equipment. The applicability of such PS arrays as masks for subsequent pattern transfer is demonstrated by fabricating arrays of cylindrical nanopores into Si.

• 出版日期2009-10-23