A roll-to-roll microwave plasma chemical vapor deposition process for the production of 294 mm width graphene films at low temperature

作者：Yamada Takatoshi^*; Ishihara Masatou; Kim Jaeho; Hasegawa Masataka; Iijima Sumio

来源：Carbon, 2012, 50(7): 2615-2619.

DOI：10.1016/j.carbon.2012.02.020

Roll-to-roll microwave plasma chemical vapor deposition (CVD) has been used for the continuous deposition of graphene films for industrial mass production. Using surface wave plasma, a pair of roll-to-roll winder and unwinder system has been built into a CVD apparatus, which has a deposition area of 294 mm x 480 mm. A graphene film was deposited onto the Cu film with 294 mm width under CH4/Ar/H-2 plasma below 400 degrees C. It was found from cross-sectional transmission electron microscopy that few layer graphene, had been produced which consists of flakes with a nanometer size. After transferring the film onto a polyethylene terephthalate film, a uniform graphene film with high optical transmittance was confirmed.

• 出版日期2012-6