Ar+NO microwave plasmas for Escherichia coli sterilization

作者：Hueso Jose L^*; Rico Victor J; Frias Jose E; Cotrino Jose; Gonzalez Elipe Agusttin R

来源：Journal of Physics D: Applied Physics , 2008, 41(9): 092002.

DOI：10.1088/0022-3727/41/9/092002

Ar + NO microwave discharges are used for sterilization and the results are compared with additional experiments with Ar, O(2) and N(2)-O(2) plasma mixtures. The NO* species produced in the Ar - NO mixtures remain up to long distances from the source, thus improving the sterilization efficiency of the process. E. coli individuals exposed to the Ar + NO plasma undergo morphological damage and cell lysis. Combined effects of etching ( by O* and Ar* species) and UV radiation ( from deactivation of NO* species) are responsible for the higher activity found for this plasma mixture.

• 出版日期2008-5-7