Atomic structure of (110) anti-phase boundaries in GaP on Si(001)

作者:Beyer A*; Haas B; Gries K I; Werner K; Luy**erg M; Stolz W; Volz K
来源:Applied Physics Letters, 2013, 103(3): 032107.
DOI:10.1063/1.4815985

摘要

High quality III/V-layers grown on Si enable a variety of optoelectronic devices. The performance of such devices is limited by anti-phase domains forming at monoatomic steps on the Si-surface. To date the atomic structure of anti-phase boundaries, which affects the charge distribution at polar interfaces, is unknown. Here, we use CS-corrected scanning transmission electron microscopy to reveal the atomic structure of the anti-phase boundaries in III/V-semiconductors, choosing GaP as a model system. We observe boundaries on (110) lattice planes which are atomically abrupt and also facetted ones, which introduces locally charged regions influencing device performance.

  • 出版日期2013-7-15