摘要
High-surface area, three-dimensional (3D) microstructures are designed and fabricated by the sequential electroplating of sacrificial and structural layers in a photoresist mold. A conformal coating of electrochemically deposited nickel hydroxide (Ni(OH)(2)) films on these MEMS-enabled multilayer structures enabled the formation of functional electrodes for electrochemical energy storage devices. The characterization of the electrodes is performed galvanostatically at various charge and discharge rates. Electrodes with a varying number of laminations are shown to yield areal capacities from 0.1 to 5.2 mAh cm(-2). Power characteristics of the electrodes are determined by applying ultra-high charge rates of up to 120 C. At this high charge rate, the electrode is able to deliver 90% of its capacity.
- 出版日期2013-11