Stability of a thin elastic film close to a rigid plate

作者：Chen Yi chao; Fried Eliot^*; Tortorelli Daniel A

来源：Journal of the Mechanics and Physics of Solids, 2012, 60(5): 904-920.

DOI：10.1016/j.jmps.2012.01.011

• Pattern formation
• Energy minimization
• Instability
• Bifurcation
• Attractive and repulsive van der Waals interactions

We introduce and study a variational model for the formation of patterns induced by bringing the surface of a rigid plate into contact proximity with the surface of a polymeric film strongly bonded to a substrate. We treat the film as a homogeneous, isotropic, hyperelastic solid and account for both attractive and repulsive van der Waals interactions between the film surface and the proximate contractor. Aside from confirming the intuitive expectation that the presence of a repulsive contribution to the van der Waals potential should stabilize patterns that form on the film surface, we elucidate the role of repulsive interactions at the onset of instability. For a recently proposed van der Waals potential involving two parameters, the Hamaker constant A and the equilibrium spacing de, our results include estimates for the critical gap d(c) at which undulations appear on the film surface, the corresponding wavenumber k(c) of the undulations, and a lower bound f(m) for the attractive force needed to induce the undulations. To leading order, d(c) similar to(Ah/mu)(1/4), k(c) similar to 1/h, and f(m) similar to (mu(3)A/h(3))(1/4), where h and mu denote the thickness and infinitesimal shear modulus of the film.

• 出版日期2012-5