Mechanical durability of ultra-water-repellent thin film by microwave plasma-enhanced CVD

作者：Wu YY^*; Bekke M; Inoue Y; Sugimura H; Kitaguchi H; Liu CS; Takai O

来源：Thin Solid Films, 2004, 457(1): 122-127.

DOI：10.1016/j.tsf.2003.12.007

• ultra-water-repellency
• mechanical durability
• hard thin film
• microwave plasma-enhanced CVD silicon dioxide

Here we present the results of the mechanical properties of hard ultra-water-repellent film prepared by microwave plasma-enhanced CVD methods, using trimethylmethoxysilane (TMMOS) as a raw material and CO2 as an additive gas, and following by a hydrophobicity treatment. This study was focused on the influence of partial pressure of TMMOS and total pressure on the mechanical properties. The results showed that lower partial pressure was responsible for better mechanical properties but for a worse water repellency. The total pressure has a less effect on the mechanical properties but a more significant effect on the water repellency. The mechanical durability was also evaluated for films prepared on the optimal conditions.

• 出版日期2004-6-1